Multiple field of view calibration plate having a reqular array

Optics: measuring and testing – Standard

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356237, G01N 2100

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active

058254838

ABSTRACT:
A multiple field of view calibration plate is provided both for coordinating multiple fields of view of a plurality of cameras so as to facilitate determining the distance between features on a semiconductor wafer, each feature being disposed within a different field of view, and for correcting image distortion within each field of view. The multiple field of view calibration plate is particularly suited for use in semiconductor manufacturing, and includes a substantially rigid dimensionally-stable substrate having a systematic array of features that are sized such that more than one of the features can fit within a field of view. The array is of a spatial extent such that more than one of the fields of view are substantially filled with the features. Also, the systematic assay of features is characterized by a distribution density suitable for correcting image distortion within a field of view. The systematic array can be a regular array, each feature being separated from each nearest neighboring feature by an equal distance. Alternatively, the separation between neighboring features is a function of position on the substrate, so that given the relative location of two neighboring features, their position on the substrate can be deduced In addition, the substrate includes more than one landmark, each landmark being located at one of a plurality of possible camera positions, where the possible camera positions are of known relative position, so as to facilitate determining the distance between features each disposed within a different field of view.

REFERENCES:
patent: 4557599 (1985-12-01), Zimring
patent: 5113565 (1992-05-01), Cipolla et al.
patent: 5145432 (1992-09-01), Midland et al.
Solid State Technology, Worldwide Semiconductor Production, vol. 37, No. 11, Nov. 1994, Advertisement No. 14, "Cathy Knows Calibration", VLSI Standards Inc.

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