Multiple-exposure drawing apparatus and method thereof

Details Multiple-exposure drawing apparatus and method thereof Multiple-exposure drawing apparatus and method thereof

2005-04-26

2005-04-26

Thompson, A. M. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

06886154

ABSTRACT:
A multi-exposure drawing apparatus for drawing a given pattern on a workpiece is provided. The apparatus uses an exposure unit with optical modulation elements arranged in a matrix. The apparatus comprises a first, second, and third memory, a coordinate transformation processor, a calculation processor, and an exposure-data generating processor. The first, second, and third memory respectively stores raster-data of the given pattern, first-coordinate data representing a position of each optical modulation element, and second-coordinate data representing a position of the exposure unit. The coordinate transformation is performed for the first-coordinate data. Address-data is calculated in accordance with a pixel size of the raster-data, and is based on the sum of the first and second coordinate data. Exposure-data generated by outputting the raster-data of the address-data is given to each of the optical modulation elements. The given pattern is drawn on the drawing surface as to the exposure-data.

REFERENCES:
patent: 4888616 (1989-12-01), Nanamura et al.
patent: 5049901 (1991-09-01), Gelbart
patent: 5079544 (1992-01-01), DeMond et al.
patent: 5955776 (1999-09-01), Ishikawa
patent: 6251550 (2001-06-01), Ishikawa
patent: 9-17718 (1997-01-01), None

Affiliated with

Also associated with

Rating

Multiple-exposure drawing apparatus and method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple-exposure drawing apparatus and method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple-exposure drawing apparatus and method thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3374300