Multiple beam laser exposure system for liquid crystal shutters

Details Multiple beam laser exposure system for liquid crystal shutters Multiple beam laser exposure system for liquid crystal shutters

1993-11-12

1995-04-11

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430319, 430397, G03C 504

Patent

active

054057337

ABSTRACT:
A method for fabricating liquid crystal shutters using a laser exposure system. An output beam from the laser is split into multiple exposure beams and a photoresist coated substrate having a metallic layer is caused to traverse the beams. The substrate is then processed leaving multiple parallel electrodes on the substrate surface.

REFERENCES:
patent: 3148085 (1964-09-01), Wiegmann
patent: 4021239 (1977-05-01), Ogawa
patent: 4032343 (1977-06-01), Deml

Affiliated with

Also associated with

Rating

Multiple beam laser exposure system for liquid crystal shutters does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple beam laser exposure system for liquid crystal shutters, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple beam laser exposure system for liquid crystal shutters will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1537604