Multiple beam ellipsometer

Details Multiple beam ellipsometer Multiple beam ellipsometer

2008-01-22

2008-01-22

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S368000, C356S364000

Reexamination Certificate

active

11545434

ABSTRACT:
An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and, consequently, a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

REFERENCES:
patent: 4585348 (1986-04-01), Chastang et al.
patent: 4653924 (1987-03-01), Itonaga et al.
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5872630 (1999-02-01), Johs et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 5973787 (1999-10-01), Aspnes et al.
patent: 5995226 (1999-11-01), Abe et al.
patent: 6031614 (2000-02-01), Michaelis et al.
patent: 6134011 (2000-10-01), Klein et al.
patent: 6181421 (2001-01-01), Aspnes et al.
patent: 6256097 (2001-07-01), Wagner
patent: 6278519 (2001-08-01), Rosencwaig et al.
patent: 6373871 (2002-04-01), Hemmes et al.
patent: 6515745 (2003-02-01), Vurens et al.
patent: 6757056 (2004-06-01), Meeks et al.
patent: 42 19 691 (1992-06-01), None
patent: 62069151 (1987-03-01), None
patent: 04127004 (1992-04-01), None
patent: 0 816 926 (1998-01-01), None
patent: 1 245 922 (2002-10-01), None
patent: 62-28606 (1987-02-01), None
patent: 4-127004 (1992-04-01), None
N. Blayo et al., “Ultraviolet-visible ellipsometry for process control during the etching of submicrometer features,”J. Opt. Soc. AM. A, vol. 12, No. 3, Mar. 1995, pp. 591-599.
K. Hoshi et al., “KrF Resist Pattern Monitoring by Ellipsometry,”Jpn. J. Appl. Phys.,vol. 36 (1997), pp. 7717-7719.
L-Y. Chen et al., “Improved rotating analyser-polarizer type of scanning ellipsometer,”Thin Solid Films,vol. 234 (1993), pp. 385-389.
Chen et al., “Design of a scanning ellipsometer by synchronous rotation of the polarizer and analyzer,”Appl. Opt.vol. 33, No. 7, Mar. 1, 1994, pp. 1299-1305.
J. Lee et al., “Rotating-compensator multichannel ellipsometry for characterization of the evolution of nonuniformities in diamond thin-film growth,”Applied Physics Letters..vol. 72, No. 8, Feb. 23, 1998, pp. 900-9002.
J. Lee et al., “Rotating-compensator multichannel ellipsometry: applications for real time Stokes vector spectroscopy of thin film growth,”Review of Scientific Instruments,vol. 69, No. 4, Apr. 1998, pp. 1800-1804.

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