Multiple beam ellipsometer

Details Multiple beam ellipsometer Multiple beam ellipsometer

2006-01-10

2006-01-10

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S368000, C356S364000, C356S237400, C356S237600

Reexamination Certificate

active

06985228

ABSTRACT:
An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and consequently in a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

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