Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent
1995-12-22
2000-02-01
Crane, Sara
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
257756, 257758, H01L 2348
Patent
active
060206411
ABSTRACT:
A multilevel interconnection between a polycide layer and a polysilicon layer and a method of forming thereof are provided. The multilevel interconnection comprises: a first impurity-containing conductive layer formed on a semiconductor substrate; a first silicide layer, having a first region thinner than a second region, formed on the first impurity-containing conductive layer; an interlayer dielectric layer formed in other than the first region; a contact hole for exposing the first silicide layer of the first region; and a second impurity-containing conductive layer connected to the first silicide layer through the contact hole. Therefore, increases in contact resistance between conductive layers can be prevented.
REFERENCES:
patent: 4479850 (1984-10-01), Beinvogl et al.
patent: 4707723 (1987-11-01), Okamoto et al.
patent: 5160407 (1992-11-01), Latchford et al.
patent: 5187552 (1993-02-01), Hendrickson et al.
patent: 5250846 (1993-10-01), Kondo
patent: 5323049 (1994-06-01), Motonami
patent: 5442238 (1995-08-01), Takata
patent: 5587604 (1996-12-01), Machesney et al.
patent: 5616934 (1997-04-01), Dennison et al.
Lee Soo-cheol
Lee Yong-jae
Crane Sara
Samsung Electronics Co,. Ltd.
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