Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2007-10-02
2010-06-15
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S190000, C430S270100, C430S326000, C430S330000, C430S944000
Reexamination Certificate
active
07736833
ABSTRACT:
Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
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Angelopoulos Marie
Babich Katherina E.
LaTulipe Douglas Charles
Lin Qinghuang
Medeiros David R.
Beck Thomas A.
Chu John S
International Business Machines - Corporation
Morris Daniel P.
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