Multilayer photosensitive solvent-processable litho element

Details Multilayer photosensitive solvent-processable litho element Multilayer photosensitive solvent-processable litho element

1980-04-21

1982-01-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430302, 430309, 430322, G03C 178

Patent

active

043117848

ABSTRACT:
An improved photosensitive litho element comprises, in order, a support, a non-photosensitive solvent-soluble contiguous layer having an optical density of at least 3.0 in the visible region of the spectrum and a maximum thickness of 0.015 mm, and a solvent-processable photosensitive layer. Dot-etchable contact litho negatives and positives are provided.

REFERENCES:
patent: 2791504 (1957-05-01), Plambeck
patent: 3879920 (1975-04-01), Gervay
patent: 4123272 (1978-10-01), Quinn
patent: 4126466 (1978-11-01), Roos

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