Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1981-03-30
1982-12-07
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430394, 430396, 430502, 430503, G03F 702, G03C 176
Patent
active
043628095
ABSTRACT:
An improved photoetch technique is presented of the portable-conformable-mask type wherein a thin top layer of resist and a thick planarizing layer are deposited on a substrate and the thin layer is exposed and developed to produce a portable-conformable-mask. The improvement involves dissolving a suitable dye in a layer between the thin top layer and the substrate. The dye is preferably selected to absorb light of the wavelengths used to expose the top layer but does not interfere with processing of the other layers.
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IBM Technical Disclosure, Khoury et al., vol. 13, No. 1, 1970 p. 38.
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Bartlett Keith G.
Chen Mung
Hillis Gary
Trutna, Jr. William R.
Watts Michael P. C.
Downey Mary F.
Frazzini John A.
Hewlett--Packard Company
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