Etching a substrate: processes – Forming or treating optical article
Patent
1994-10-06
1996-09-03
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 66, B44C 122
Patent
active
055515878
ABSTRACT:
A method of manufacturing multilayer mirrors for use in conjunction with X-rays. Customary multilayer mirrors are composed of discrete, thin layers which generally consist of alternating absorption and spacer layers. In order to counteract surface roughness of the thin layers, it is known to smoothen the layers by ion etching after deposition. A drawback thereof consists in that the material of one layer penetrates into the other layer, so that the location of the interface and the thickness of the layers of the multilayer mirror are no longer suitably defined. In accordance with the invention, a multilayer mirror is manufactured by stimulating the penetration of one of the materials into the layer with the other material, after which the original layer thickness of the first material is removed by etching. By repeating this process one layer after the other, a multilayer mirror is obtained which does not consist of an alternation of uniform, discrete layers of a different material but of recurrent layers of one of the materials in which the other material has penetrated.
REFERENCES:
E. J. Puik et al., "Ion bombardment of thin layers: The effect on the interface roughness and its x-ray reflectivity (invited)", Rev. Sci. Instrum. 63, Jan. 1992, American Institute of Physics, pp. 1415-1419.
E. J. Puik et al., "Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings", Applied surface Science 47, 1991, pp. 63-76.
R. Schlatmann et al., "Limits to Ion Beam etching of Mo/Si multilayer coatings", Proceedings of "Physics of X-ray Multilayer Structures", Technical Digest Services, vol. 7.
Keppel Anton
Schlatmann Rutger
Verhoeven Jan
Eason Leroy
Powell William
U.S. Philips Corporation
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