Multilayer MEMS device and method of making same

Details Multilayer MEMS device and method of making same Multilayer MEMS device and method of making same

2008-05-06

2008-05-06

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S311000, C430S322000

Reexamination Certificate

active

07368228

ABSTRACT:
A method of creating a microelectromechanical systems (MEMS) device includes applying a layer of photoresist to a lower layer to create a multilayer MEMS device. The method includes transferring the layer of photoresist to the lower layer. The method can also include spincoating the photoresist onto a release layer, softbaking the spincoated photoresist to at least partially dry it, transferring the photoresist to form a layer of the multilayer MEMS device, and exposing the photoresist to light to crosslink it. The multilayer MEMS device includes a plurality of layers of photoresist.

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SU-8: A Thick Photo-Resist for MEMS, website pages from http://aveclafaux.freeservers.com/SU-8.html, Nov. 4, 2003.

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