Multilayer material and method of preparing same

Details Multilayer material and method of preparing same Multilayer material and method of preparing same

2011-03-08

2011-03-08

Meeks, Timothy H (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C359S722000, C359S589000

Reexamination Certificate

active

07901736

ABSTRACT:
The invention relates to a multilayer material deposited by ALD. A multi-layer structure of a high refractive index material is deposited on a substrate using ALD at a temperature below about 450° C. Advantageous results are obtained when a high refractive index material A is coated with another material B after a certain thickness of material A has been achieved. Thus, the B barrier layer stops the tendency for material A to crystallize. The amorphous structure gives rise to less optical loss. Further, the different stress nature of materials A and B may be utilized to achieve a final optical material with minimal stress. The thickness of each material B layer is less than that of the adjacent A layer(s). The total effective refractive index of the high refractive index material A+B being shall be greater than 2.20 at a wavelength of 600 nm. Titanium oxide and aluminium oxide are preferred A and B materials. The structure is useful for optical coatings.

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USPTO translation of paragraph in Kosaku (JP2004-176081), paragraph [0024].
Kattelus H. et al., “Layered Tantalum-Aluminum Oxide Films Deposited by Atomic Layer Epitaxy,” Thin Solid Films, Elsevier-Sequoia S.A. Lausanne, CH LNKD-DOI:10.1016/0040-6090(93)90173-M, vol. 225, No. 1/02, Mar. 25, 1993, pp. 296-298 XP000358326 ISSN: 0040-6090.
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