Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate
2006-10-06
2009-10-06
Fineman, Lee (Department: 2872)
Optical: systems and elements
Having significant infrared or ultraviolet property
Multilayer filter or multilayer reflector
C359S584000, C359S586000
Reexamination Certificate
active
07599112
ABSTRACT:
Multilayer-film (MLF) reflective mirrors are disclosed that have a highly precise surface profile. An exemplary MLF reflective mirror includes multilayer film in which layers of molybdenum (Mo) and layers of silicon (Si) are periodically deposited in an alternating manner on the surface of a mirror substrate. One or more selected regions of the multilayer film have been “shaved” away layer-wise as required to impart an in-plane distribution of removed material sufficient to correct a wavefront error in light reflected from the mirror. After such “layer-machining,” a single-layer film of Si (or Si-containing material) is applied to fill in the machined areas and restore the original contour, as designed, for the surface of the multilayer film. I.e., the Si film has a thickness distribution corresponding to the depth profile of material removed from the multilayer film. A capping layer can be deposited uniformly on the surface of the single-layer film.
REFERENCES:
patent: 5757017 (1998-05-01), Braat
patent: 6392792 (2002-05-01), Naulleau
patent: 6833223 (2004-12-01), Shiraishi
patent: 7050237 (2006-05-01), Chapman
patent: 2002/0084425 (2002-07-01), Klebanoff et al.
patent: 2002/0171922 (2002-11-01), Shiraishi et al.
patent: 2003/0008148 (2003-01-01), Bajt et al.
patent: 2003/0008180 (2003-01-01), Bajt et al.
patent: 2003/0081722 (2003-05-01), Kandaka et al.
patent: 2003/0147139 (2003-08-01), Kandaka et al.
patent: 2004/0061868 (2004-04-01), Chapman et al.
patent: 2004/0256047 (2004-12-01), Sekine
patent: 2005/0109278 (2005-05-01), Liang et al.
patent: 2005/0117233 (2005-06-01), Kanazawa et al.
patent: 2005/0157384 (2005-07-01), Shiraishi et al.
patent: 2006/0040418 (2006-02-01), Takaoka
patent: 1 152 435 (2001-07-01), None
patent: 2003-14893 (2003-01-01), None
patent: WO 01/41155 (2001-06-01), None
Berning, “Survey of Computational Methods and Techniques in Thin Film Optics,”Physics of Thin Films, 1963, pp. 84-100, vol. 1, Academic Press.
Braat, “Phase correcting layers in EUV imaging systems for microlithography,”Proceedings of OSA TOPS on Extreme Ultraviolet Lithography, 1996, pp. 152-155, vol. 4, Optical Society of America.
Gwyn et al., “Extreme ultraviolet lithography,”J. Vac. Sci. Technol., Nov./Dec. 1998, pp. 3142-3149, B 16(6), American Vacuum Society.
Kinoshita et al., “Soft x-ray reduction lithography using multilayer mirrors,”J. Vac. Sci. Technol., Nov./Dec. 1989, pp. 1648-1651, B7(6), American Vacuum Society.
Stuik et al., “Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography,”J. Vac. Sci. Technol., Nov./Dec. 1999, pp. 2998-3002, B 17(6), American Vacuum Society.
Yamamoto et al., “Layer-by-layer design method for soft-x-ray multilayers,”Applied Optics, Apr. 1992, pp. 1622-1630, vol. 31, No. 10, Optical Society of America.
Yamamoto, “Sub-nm Figure Error Correction of an EUV Multilayer Mirror by Its Surface Milling,”7thInternational Conference on Synchrotron Radiation Instrumentation, Book of Abstracts, 2000, 1 page.
Yamamoto, “Sub-nm figure error correction of an extreme ultraviolet multilayer mirror by its surface milling,”Nuclear Instruments and Methods in Physics Research A, 2001, pp. 1282-1285, 467-468, Elsevier Science B.V.
Majkova et al., “Figure Error Correction by Reflection Wavefront Control of Cu Ka Grazing Incidence Multilayer Mirrors,” Optical Review, Vol. 10, No. 5, pp. 398-401, 2003.
European Search Report mailed May 28, 2009, from Epc Application No. 06 81 1216.8.
Fineman Lee
Klarquist & Sparkman, LLP
Nikon Corporation
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