Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-09-29
1988-07-12
Martin, Roland E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430258, 430260, 430273, 430286, 430285, 430281, 430533, 430534, 430961, 430277, 430939, 430256, 430257, 430259, 430299, 156335, 156327, 522 96, G03C 194, G03C 500, G03C 168
Patent
active
047569883
ABSTRACT:
Dry-film, negative-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist can suffer from slow speeds, brittleness, variable adhesive characteristics, and narrow processing latitude during development and exposure. The use of a crosslinked or crosslinkable integral thermoplastic adhesive laer on the dry-film, negative-acting photoresist layer improves the properties and performance of the photoresist.
REFERENCES:
patent: 3186844 (1962-07-01), Alles et al.
patent: 3231382 (1966-01-01), Silver
patent: 3469982 (1969-09-01), Celeste
patent: 3526504 (1970-09-01), Celeste
patent: 3861921 (1975-01-01), Hoffman et al.
patent: 4180604 (1979-12-01), Feng et al.
patent: 4189320 (1980-02-01), Hsich
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4204009 (1980-05-01), Feng et al.
patent: 4349620 (1982-09-01), Cyr et al.
patent: 4355093 (1982-10-01), Hartmann et al.
patent: 4360560 (1982-11-01), Kopnick et al.
Kausch William L.
Vikesland John P.
Hamilton C.
Litman Mark A.
Martin Roland E.
Minnesota Mining and Manufacturing Company
Sell Donald M.
LandOfFree
Multilayer dry-film negative-acting photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multilayer dry-film negative-acting photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer dry-film negative-acting photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-664061