Multilayer composites and manufacture of same

Details Multilayer composites and manufacture of same Multilayer composites and manufacture of same

2006-02-07

2006-02-07

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192240, C204S298120, C204S298130, C505S816000

Reexamination Certificate

active

06994775

ABSTRACT:
The present invention is directed towards a process of depositing multilayer thin films, disk-shaped targets for deposition of multilayer thin films by a pulsed laser or pulsed electron beam deposition process, where the disk-shaped targets include at least two segments with differing compositions, and a multilayer thin film structure having alternating layers of a first composition and a second composition, a pair of the alternating layers defining a bi-layer wherein the thin film structure includes at least 20 bi-layers per micron of thin film such that an individual bi-layer has a thickness of less than about 100 nanometers.

REFERENCES:
patent: 3985635 (1976-10-01), Adam et al.
patent: 4866032 (1989-09-01), Fujimori et al.
patent: 4915810 (1990-04-01), Kestigian et al.
patent: 5308461 (1994-05-01), Ahonen

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