X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-08-10
2009-06-23
Glick, Edward J (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S086000
Reexamination Certificate
active
07551719
ABSTRACT:
Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. A motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.
REFERENCES:
patent: 2805342 (1957-09-01), Lang
patent: 4242588 (1980-12-01), Silk et al.
patent: 4696024 (1987-09-01), Pesch
patent: 4725963 (1988-02-01), Taylor et al.
patent: 4847882 (1989-07-01), Knoth et al.
patent: 4989226 (1991-01-01), Woodbury et al.
patent: 5151588 (1992-09-01), Kiri et al.
patent: 5373544 (1994-12-01), Goebel
patent: 5574284 (1996-11-01), Farr
patent: 5619548 (1997-04-01), Koppel
patent: 5740226 (1998-04-01), Komiya et al.
patent: 5850425 (1998-12-01), Wilkins
patent: 5923720 (1999-07-01), Barton et al.
patent: 5949847 (1999-09-01), Terada et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6041098 (2000-03-01), Touryanski et al.
patent: 6192103 (2001-02-01), Wormington et al.
patent: 6226347 (2001-05-01), Golenhofen
patent: 6226349 (2001-05-01), Schuster et al.
patent: 6381303 (2002-04-01), Vu et al.
patent: 6389102 (2002-05-01), Mazor et al.
patent: 6453006 (2002-09-01), Koppel et al.
patent: 6507634 (2003-01-01), Koppel et al.
patent: 6512814 (2003-01-01), Yokhin et al.
patent: 6556652 (2003-04-01), Mazor et al.
patent: 6625250 (2003-09-01), Houge
patent: 6639968 (2003-10-01), Yokhin et al.
patent: 6643354 (2003-11-01), Koppel et al.
patent: 6680996 (2004-01-01), Yokhin et al.
patent: 6711232 (2004-03-01), Janik
patent: 6744950 (2004-06-01), Aleksoff
patent: 6750952 (2004-06-01), Grodnesnsky et al.
patent: 6754304 (2004-06-01), Kumakhov
patent: 6754305 (2004-06-01), Rosencwaig et al.
patent: 6771735 (2004-08-01), Janik et al.
patent: 6810105 (2004-10-01), Nasser-Ghodsi et al.
patent: 6895075 (2005-05-01), Yokhin et al.
patent: 6898270 (2005-05-01), Lange et al.
patent: 6996208 (2006-02-01), Helming et al.
patent: 7062013 (2006-06-01), Berman et al.
patent: 7068753 (2006-06-01), Berman et al.
patent: 7110491 (2006-09-01), Mazor et al.
patent: 7120228 (2006-10-01), Yokhin et al.
patent: 7158608 (2007-01-01), Kucharczyk
patent: 7213686 (2007-05-01), Kaufman
patent: 7242745 (2007-07-01), He et al.
patent: 2001/0028699 (2001-10-01), Iwasaki
patent: 2001/0043668 (2001-11-01), Hayashi et al.
patent: 2002/0097837 (2002-07-01), Fanton et al.
patent: 2002/0110218 (2002-08-01), Koppel et al.
patent: 2003/0043965 (2003-03-01), Bahr et al.
patent: 2003/0157559 (2003-08-01), Omote et al.
patent: 2004/0052330 (2004-03-01), Koppel et al.
patent: 2004/0109531 (2004-06-01), Yokhin et al.
patent: 2004/0131151 (2004-07-01), Berman et al.
patent: 2004/0156474 (2004-08-01), Yokhin et al.
patent: 2004/0218717 (2004-11-01), Koppel et al.
patent: 2006/0023836 (2006-02-01), Berman et al.
patent: 2006/0088139 (2006-04-01), Nakano et al.
patent: 2006/0115046 (2006-06-01), Berman et al.
patent: 2006/0182220 (2006-08-01), Berman et al.
patent: 05-188019 (1993-07-01), None
patent: 07-311163 (1995-11-01), None
patent: 10-048398 (1998-02-01), None
patent: 11014561 (1999-01-01), None
patent: WO 01/24200 (2001-04-01), None
patent: WO 03087795 (2003-10-01), None
Bowen et al., “X-Ray metrology by Diffraction and Reflectivity,”Characterization and Metrology for ULSI Technology: 2000 International Conference(American Institute of Physics, 2001), pp. 570-579.
Goorsky et al., “Grazing Incidence In-plane Diffraction Measurement of In-plane Mosaic with Microfocus X-ray Tubes,”Crystal Research and Technology37:7 (2002), pp. 645-653.
Parrill et al., “GISAXS—Glancing Incidence Small Angle X-ray Scattering,”Journal de Physique IV3 (Dec. 1993), pp. 411-417.
“Grazing incidence in-plane diffraction measurement of in-plane mosaic with microfocus X-ray tubes”, By Goorsky, et al., Crystal Research and Technology 37:7 (2002), pp. 645-653.
Wiener et al., “Characterization of Titanium Nitride Layers by Grazing-Emission X-Ray Fluorescence Spectrometry,” in Applied Surface Science 125 (1998), p. 129.
Hayashi et al., “Refracted X-Rays Propagating Near the Surface under Grazing Incidence Condition,” Spectrochimica Acta, Part B 54, 1999, pp. 227-230.
Series 5000 Model XTF5011 X-Ray Tube Information, Oxford Instruments Inc., Scotts Valley, GA, U.S.A., Jun. 1998.
Monolithic Polycapillary Lens Information, X-Ray Optical Systems, Inc., Albany, NY, U.S.A., Dec. 29, 1998. (web site: www.xos.com).
S. Di Fonzo et al., “Non-Destructive Determination of Local Strain with 100-Nanometre Spatial Resolution,” Nature, vol. 403, Feb. 10, 2000. (web site: www.nature.com).
Hugues Guerault, “Specular reflectivity and off-specular scattering,” Tools for roughness investigation, Dec. 2000.
Jones, et al., “Small angle x-ray scattering for sub-100 nm pattern characterization,” Applied Physics Letters 83:19 (2003), pp. 4059-4061.
Hu et al., “Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings,” Journal of Applied Physics 96:4 (2004), pp. 1983-1987.
Wu et al., “Small angle neutron scattering measurements of nanoscale lithographic features,” Journal of Applied Physics 88:12 (2000), pp. 7298-7303.
Kojima, et al., “Structural characterization of thin films by x-ray reflectivity,” Rigaku Journal 16:2 (1999), pp. 31-41.
Stommer, “X-ray scattering from silicon surfaces,” in Semiconductor International (May 1, 1998).
Yoneda, “Anomalous surface reflection of X Rays,” Physical Review 131, pp. 2010-2012, 1963.
Stommer, et al., “Characterization of semiconductor materials by X-ray scattering,” Electrochemical Society Proceedings, vol. 99-16, pp. 117-133, 1999.
Ulyanekov, “Introduction to high resolution X-Ray diffraction,” Workshop on X-ray characterization of thin layers (Uckley, May 21, 23, 2003).
Ito, “X-ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films,” Presented at the International Sematech Ultra-Low-k Workshop (San Francisco, CA, Jun. 6-7, 2002).
Naudon, et al., “New apparatus for grazing X-ray reflectometry in the angle-resoived dispersive mode,” J. Appl. Cryst. 1989, vol. 22, pp. 46-464.
N. Wu, et al., “Substepping and its Application to HST Imaging,” Jul. 28, 2003.
Wormington, Characterization of Pore Size Distribution in Low k Dielectrics Using X-ray Reflectivity, presented at the Sematech Gate Stack Engineering Workshop (Austin, Texas, May 2, 2002).
J. Spear, “Mettrology for low-k materials,” Silknet Alliance, 2003.
Jaklevic, et al, “High Rate X-Ray Fluorescence Analysis by Pulsed Excitation,” IEEE Transactions on Nuclear Science NS-19:3 (1972), pp. 392-395.
Jaklevic, et al., “Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers,” Advances in X-Ray Alaysis 15 (1972) pp. 266-275.
Jaklevic, et al., “Energy Dispersive X-Ray Fluorescence Spetrometry Using Pulsed X-Ray Excitation,” Advances in X-Ray Analysis 19 (1976).
Kozaczek, et al., “X-ray Diffraction Metrology for 200mm Process Qualification and Stability Assessment,” Advanced Metallization Conference (Montreal, Canada) Oct. 8-11, 2001.
U.S. Appl. No. 11/389,490, Office Action dated May 1, 2008.
Gvirtzman Amos
Krokhmal Alexander
Mazor Isaac
Rafaeli Tzachi
Yokhin Boris
Glick Edward J
Jordan Valley Semiconductord Ltd
Midkiff Anastasia
Weingarte, Schurgin, Gagnebin & Lebovici LLP
LandOfFree
Multifunction X-ray analysis system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multifunction X-ray analysis system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multifunction X-ray analysis system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4106896