Multichamber integrated process system

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

118715, 118717, 118729, 118723E, 20429825, 414217, C23C 1600, B65G 106

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active

052923932

ABSTRACT:
An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuum process chambers to the load lock chamber. A robot is mounted within the load lock and utilizes a concentric shaft drive system connected to an end effector via a dual four-bar link mechanism for imparting selected R-.theta. movement to the blade to load and unload wafers at the external elevator, internal elevator and individual process chambers. The system is uniquely adapted for enabling various types of IC processing including etch, deposition, sputtering and rapid thermal annealing chambers, thereby providing the opportunity for multiple step, sequential processing using different processes.

REFERENCES:
patent: 4405435 (1983-09-01), Tateishi
patent: 4477311 (1984-10-01), Mimura et al.
patent: 4501527 (1985-02-01), Jacoby
patent: 4547247 (1985-10-01), Warenback et al.
patent: 4553069 (1985-11-01), Purser
patent: 4592306 (1986-06-01), Gallego
patent: 4715921 (1987-12-01), Maher
patent: 4917556 (1990-04-01), Stark
patent: 4951601 (1990-08-01), Maydan
IBM Technical Disclosure Bulletin, vol. 29, No. 1, Jun. 1986.

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