Drying and gas or vapor contact with solids – Process – Gas or vapor contact with treated material
Patent
1996-06-10
1998-05-12
Bennett, Henry A.
Drying and gas or vapor contact with solids
Process
Gas or vapor contact with treated material
34509, 34500, F26B 300
Patent
active
057491607
ABSTRACT:
Environmental enhancement by controlling volatile organic compound (VOC) and NO.sub.x emissions in a flatline wafer drying system. The method is characterized by advancing the wafers of the type used in manufacture of oriented strand board (OSB) on a flatline conveyor embodying a plurality of dryer zones. Particularly, heating the dryer zones in successive lower temperatures in the range 500.degree. F. to 200.degree. F. by flowing heated air upwardly through the flatline wafer drying conveyor; removing VOC-rich exhaust air from a primary dryer zone while flowing heated air upwardly therein and removing VOC-rich exhaust air from a secondary dryer zone while flowing heated air from therein.
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Dexter Jeffrey L.
Grebe Bruce
Head Larry J.
Miller Donald E.
Nowack William
Bennett Henry A.
Doster Dinnatia
George Koch Sons, Inc.
Semmes David H.
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