Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2011-06-07
2011-06-07
Patel, Dharti H (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
Reexamination Certificate
active
07957118
ABSTRACT:
A method for processing a semiconductor wafer comprises measuring data indicating an amount of warpage of the wafer. At least two different voltages are determined, based on the amount of warpage. The voltages are to be applied to respective portions of the wafer by an electrostatic chuck that is to hold the wafer. The at least two different voltages are applied to hold the respective portions of the wafer while performing a fabrication process on the wafer.
REFERENCES:
patent: 5872694 (1999-02-01), Hoinkis et al.
patent: 5880923 (1999-03-01), Hausmann
patent: 6976901 (2005-12-01), Halley et al.
patent: 2009/0162179 (2009-06-01), Hosek et al.
Conation Technologies, KLA Spectra FX 100 Film Thickness Measurement Tool, Internet Article, www.conationtech.com. USA, Vintage 2003.
Computer Business Review, KLA-Tencor Launches Measurement Solution, Published Dec. 3, 2007 by BR staff writer, Internet Article, www.cbronline.com. USA, Apr. 1, 2009.
KLA-TENCOR, WaferSight 2, Internet Article, www.kla-tencor.com. USA, Mar. 31, 2009.
KLA-TENCOR, Prometrix UV-1250SE/Thin Film Measurement System—Product Description, Internet Article, www.kla-tencor.com. USA, Mar. 31, 2009.
KLA-TENCOR, SpectraFx 100/Advanced Optical Thin Film Metrology—Product Description, Internet Article, www.kla-tencor.com. USA, Mar. 31, 2009.
Chang Yi-Pin
Huang Soon Kang
Lai Tung Long
Duane Morris LLP
Koffs Steven E.
Patel Dharti H
Taiwan Semiconductor Manufacturing Co. Ltd.
LandOfFree
Multi-zone electrostatic chuck and chucking method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multi-zone electrostatic chuck and chucking method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-zone electrostatic chuck and chucking method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2637186