Multi-tone optical mask, method of manufacturing the same...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S311000, C430S322000

Reexamination Certificate

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07846618

ABSTRACT:
A multi-tone optical mask includes a substrate, a light-blocking pattern, a first semi-transmitting pattern and a second semi-transmitting pattern. The light-blocking pattern is formed on the substrate. The first semi-transmitting pattern is formed on the substrate. The second semi-transmitting pattern partially overlaps the first semi-transmitting pattern. The multi-tone optical mask has at least five different light-transmittances corresponding to a plurality of areas divided on the substrate.

REFERENCES:
patent: 5391441 (1995-02-01), Imai et al.
patent: 6180290 (2001-01-01), Hsu et al.
patent: 2002/0132173 (2002-09-01), Rolfson
patent: 2005/0112478 (2005-05-01), Taravade et al.
patent: 2005/0196683 (2005-09-01), Henke et al.
patent: 2000-0047011 (2000-07-01), None
Korean Patent Abstracts, Publication No. 1020000047011, Jul. 25, 2000, 1 p.

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