Coating processes – Coating by vapor – gas – or smoke – Moving the base
Reexamination Certificate
2005-08-05
2009-06-16
Culbert, Roberts P (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
Moving the base
C427S251000, C427S248100, C118S719000, C118S720000
Reexamination Certificate
active
07547465
ABSTRACT:
A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.
REFERENCES:
patent: 5916365 (1999-06-01), Sherman
patent: 6026589 (2000-02-01), Yao et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6143082 (2000-11-01), McInerney et al.
patent: 6143659 (2000-11-01), Leem
patent: 6174377 (2001-01-01), Doering et al.
patent: 6203613 (2001-03-01), Gates et al.
patent: 6206967 (2001-03-01), Mak et al.
patent: 6319553 (2001-11-01), McInerney et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6576062 (2003-06-01), Matsuse
patent: 6592942 (2003-07-01), Van Wijck
patent: 6627558 (2003-09-01), Rose
patent: 6831315 (2004-12-01), Raaijmakers et al.
patent: 63-266072 (1988-11-01), None
patent: 2002 2060944 (2002-02-01), None
patent: WO 01/27346 (2001-04-01), None
patent: WO 01/27347 (2001-04-01), None
patent: WO 01/29891 (2001-04-01), None
patent: WO 01/29893 (2001-04-01), None
Klaus, et al., “Atomically Controlled Growth of Tungsten and Tungsten Nitride Using Sequential Surface Reactions,” Applied Surface Science, 162-163 (2000), 479-491.
Chang Mei
Glenn Walter B.
Lei Lawrence C.
Applied Materials Inc.
Culbert Roberts P
Patterson & Sheridan LLP
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