Multi-source plasma focused ion beam system

Details Multi-source plasma focused ion beam system Multi-source plasma focused ion beam system

2007-07-16

2011-12-13

Vanore, David A (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S492210, C250S492300, C250S42300F

Reexamination Certificate

active

08076650

ABSTRACT:
The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

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