Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1998-07-10
2000-12-19
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
Multizone chamber
414217, 414936, 414937, 414939, C23C 1600
Patent
active
061622990
ABSTRACT:
A machine for manufacturing semiconductor devices has a. processing chamber for processing the semiconductor wafer. A transfer chamber has at least two positions, one position to facilitate the transfer of a wafer to be processed into the transfer chamber and to facilitate the transfer of a processed wafer from the transfer chamber to the cassette from which the wafer originated. The second position facilitates the transfer of a wafer to and from the processing chamber. A transfer arm simultaneously transfers an unprocessed wafer from the first position to the second position with the transfer of a processed wafer from the second position to the first position.
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ASM America Inc.
Lund Jeffrie R
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