Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-07-10
2007-07-10
Visconti, Geraldina (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S312000, C430S320000
Reexamination Certificate
active
10284327
ABSTRACT:
Stabilization of photolithography process parameters, the photomask being used, and the manufacturing method thereof is provided where a formal pattern layout is combined with a dummy pattern. A photomask is manufactured by utilizing the combined pattern layout so that density changes between the pattern structure layers of the multi-layer semiconductor integrated circuits are minimized.
REFERENCES:
patent: 6482559 (2002-11-01), Lin
patent: 2003/0088849 (2003-05-01), Yamauchi
Chen Hsin-Huei
Chiou Jia-Rong
Huang Chong-Jen
Liu Kuang-Wen
Wang Chih-Hao
Macronix International Co. Ltd.
Visconti Geraldina
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