Multi-layer polishing pad

Abrading – Machine – Rotary tool

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S290000, C451S527000, C451S533000, C451S540000

Reexamination Certificate

active

07654885

ABSTRACT:
A polishing pad has a polishing layer and a backing layer secured to the polishing layer. The polishing layer has a polishing surface, a first thickness, a first compressibility, and a hardness between about 40 to 80 Shore D. The backing layer has a second thickness greater than the first thickness and a second compressibility greater than the first compressibility. The first thickness, first compressibility, second thickness and second compressibility are such that the polishing surface deflects at least 2 mil under an applied pressure of 1 psi or less.

REFERENCES:
patent: 3499250 (1970-03-01), Jensen et al.
patent: 3504457 (1970-04-01), Jacobsen et al.
patent: 4512113 (1985-04-01), Budinger
patent: 4879258 (1989-11-01), Fisher
patent: 5177908 (1993-01-01), Tuttle
patent: 5257478 (1993-11-01), Hyde et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5791975 (1998-08-01), Cesna et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5921855 (1999-07-01), Osterheld et al.
patent: 6068539 (2000-05-01), Bajaj et al.
patent: 6135856 (2000-10-01), Tjaden et al.
patent: 6146248 (2000-11-01), Jairath et al.
patent: 6306021 (2001-10-01), Masumura et al.
patent: 6328642 (2001-12-01), Pant et al.
patent: 6354915 (2002-03-01), James et al.
patent: 6358130 (2002-03-01), Freeman et al.
patent: 6390891 (2002-05-01), Guha et al.
patent: 6402591 (2002-06-01), Thornton
patent: 6406363 (2002-06-01), Xu et al.
patent: 6406591 (2002-06-01), Beckstrom et al.
patent: 6475332 (2002-11-01), Boyd et al.
patent: 6488575 (2002-12-01), Agarwal et al.
patent: 6517426 (2003-02-01), Lee
patent: 6524164 (2003-02-01), Tolles
patent: 6537144 (2003-03-01), Tsai et al.
patent: 6551179 (2003-04-01), Halley
patent: 6561873 (2003-05-01), Tsai et al.
patent: 6561889 (2003-05-01), Xu et al.
patent: 6572463 (2003-06-01), Xu et al.
patent: 6612917 (2003-09-01), Bruxvoort
patent: 6620036 (2003-09-01), Freeman et al.
patent: 6632129 (2003-10-01), Goetz
patent: 6638143 (2003-10-01), Wang et al.
patent: 6705934 (2004-03-01), Shiro et al.
patent: 6848974 (2005-02-01), Hasegawa et al.
patent: 6855034 (2005-02-01), Hasegawa
patent: 6884156 (2005-04-01), Prasad et al.
patent: 6887136 (2005-05-01), Smith
patent: 6893337 (2005-05-01), Carlson
patent: 6905402 (2005-06-01), Allison et al.
patent: 6913517 (2005-07-01), Prasad
patent: 6935931 (2005-08-01), Prasad
patent: 6960120 (2005-11-01), Prasad
patent: 6960521 (2005-11-01), Moon et al.
patent: 7112121 (2006-09-01), Lee et al.
patent: 7132070 (2006-11-01), Shih et al.
patent: 7192340 (2007-03-01), Ono et al.
patent: 2001/0005667 (2001-06-01), Tolles et al.
patent: 2002/0004357 (2002-01-01), Baker, III et al.
patent: 2002/0102853 (2002-08-01), Li et al.
patent: 2002/0119286 (2002-08-01), Chen et al.
patent: 2002/0193054 (2002-12-01), Smith
patent: 2003/0209448 (2003-11-01), Hu et al.
patent: 2003/0213703 (2003-11-01), Wang et al.
patent: 2003/0220053 (2003-11-01), Manens et al.
patent: 2004/0020789 (2004-02-01), Hu et al.
patent: 2004/0023610 (2004-02-01), Hu et al.
patent: 2004/0121708 (2004-06-01), Hu et al.
patent: 200404648 (2004-04-01), None
Taiwan Patent Examiner, Official Letter of Pending Patent Application, Apr. 17, 2009, Taiwan Patent Office (office action for Taiwanese Application No. 95103206).
China Patent Examiner, Notice on the First OA, Mar. 16, 2009, Chinese Patent Office (office action for Chinese Application No. 200710167020.8).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-layer polishing pad does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-layer polishing pad, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-layer polishing pad will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4202040

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.