Multi-functional structure for enhanced chip...

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S765010, C257S486000, C257S635000

Reexamination Certificate

active

07098676

ABSTRACT:
An on-chip redundant crack termination barrier structure, or crackstop, provides a barrier for preventing defects, cracks, delaminations, and moisture/oxidation contaminants from reaching active circuit regions. Conductive materials in the barrier structure design permits wiring the barriers out to contact pads and device pins for coupling a monitor device to the chip for monitoring barrier integrity.

REFERENCES:
patent: 5530280 (1996-06-01), White
patent: 5786705 (1998-07-01), Bui et al.
patent: 6091131 (2000-07-01), Cook et al.
patent: 6261945 (2001-07-01), Nye et al.
patent: 6326297 (2001-12-01), Vijayendran
patent: 6403389 (2002-06-01), Chang et al.
patent: 6621290 (2003-09-01), Marathe et al.
patent: 6633083 (2003-10-01), Woo et al.
Toa et al., “Electromigration Characteristics of TiN Barrier Layer Material”, Jun. 1995 IEEE Electron Device Letters, vol. 16, No. 6. p. 230-232.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-functional structure for enhanced chip... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-functional structure for enhanced chip..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-functional structure for enhanced chip... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3614017

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.