Multi-focus scanning with a tilted mask or wafer

Details Multi-focus scanning with a tilted mask or wafer Multi-focus scanning with a tilted mask or wafer

2005-02-23

2010-02-23

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07667821

ABSTRACT:
A method for implementing discrete superpositioning of two or more defocal wafer images at different defocal positions in a lithographic step and scan projection system. The method includes tilting one of a mask and a wafer with respect to a scanning direction and splitting an illumination beam into at least two illumination areas which are in different defocus zones of the mask.

REFERENCES:
patent: 5192882 (1993-03-01), Lipovski
patent: 5481473 (1996-01-01), Kim et al.
patent: 5497334 (1996-03-01), Russell et al.
patent: 5519628 (1996-05-01), Russell et al.
patent: 5528508 (1996-06-01), Russell et al.
patent: 5625803 (1997-04-01), McNelly et al.
patent: 5692160 (1997-11-01), Sarin
patent: 5727187 (1998-03-01), Lemche et al.
patent: 5737237 (1998-04-01), Tanaka et al.
patent: 5739899 (1998-04-01), Nishi et al.
patent: 5828579 (1998-10-01), Beausang
patent: 5949692 (1999-09-01), Beausang et al.
patent: 5984510 (1999-11-01), Guruswamy et al.
patent: 5987086 (1999-11-01), Raman et al.
patent: 6006024 (1999-12-01), Guruswamy et al.
patent: 6058252 (2000-05-01), Noll et al.
patent: 6094305 (2000-07-01), Shiraishi
patent: 6106568 (2000-08-01), Beausang et al.
patent: 6113647 (2000-09-01), Silve et al.
patent: 6170080 (2001-01-01), Ginetti et al.
patent: 6209123 (2001-03-01), Mazlasz et al.
patent: 6218077 (2001-04-01), Jin
patent: 6295627 (2001-09-01), Gowni et al.
patent: 6357035 (2002-03-01), Gowni et al.
patent: 6370679 (2002-04-01), Chang et al.
patent: 6388734 (2002-05-01), Tokuda et al.
patent: 6453452 (2002-09-01), Chang et al.
patent: 6467073 (2002-10-01), Merchant
patent: 6470489 (2002-10-01), Chang et al.
patent: 6530073 (2003-03-01), Morgan
patent: 6552776 (2003-04-01), Wristers et al.
patent: 6641981 (2003-11-01), Kaneko et al.
patent: 2001/0003480 (2001-06-01), Ryuk et al.
patent: 2002/0041368 (2002-04-01), Ota et al.
patent: 214612 (1992-08-01), None
Hiroshi Fukuda et al. A New Method for Enhancing Focus Latitude in Optical Lithography: Flex IEEE Electron Device Letters, vol. EDL-8, No. 4 Apr. 1987.
Hiroshi Fukuda et al. Improvement of Defocus Tolerance in a Half-Micron Optical Lithography by the Focus Latitude Enhancement Exposure Method: Simulation and Experiment; Central Research Laboratory, Hitachi Ltd., Higashi-Koigakubo , Kokubunji, Tokyo 185, Japan Received Dec. 21, 1988; accepted Apr. 8, 1989.

Affiliated with

Also associated with

Rating

Multi-focus scanning with a tilted mask or wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-focus scanning with a tilted mask or wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-focus scanning with a tilted mask or wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4227896