Multi-exposure drawing method and apparatus therefor

Details Multi-exposure drawing method and apparatus therefor Multi-exposure drawing method and apparatus therefor

2006-11-14

2006-11-14

Pham, Hai (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S255000

Reexamination Certificate

active

07136087

ABSTRACT:
In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in both a first array-direction and a second array-direction, the exposure unit is moved in relation to the drawing surface in a drawing direction. The drawing direction is inclined to form an angle with respect to the first array-direction, whereby the exposure unit is gradually shifted in the second array-direction during the movement of the exposure unit. The modulation elements are successively and selectively operated based on pattern bit-data to thereby modulate a light beam made incident on each modulation element, whenever the exposure unit is moved in the drawing direction by a distance of “A+a”. “A” is a distance corresponding to an integer-multiple of a dimension of a unit exposure zone produced on the drawing surface by each modulation element, and “a” is a smaller distance than the dimension of the unit exposure.

REFERENCES:
patent: 5049901 (1991-09-01), Gelbart
patent: 6121984 (2000-09-01), Anderson
patent: 6251550 (2001-06-01), Ishikawa
patent: 6537738 (2003-03-01), Mei et al.
patent: 6700597 (2004-03-01), Fujii
patent: 9-17718 (1997-01-01), None
patent: 10-147007 (1998-06-01), None

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