Multi directional mechanical scanning in an ion implanter

Details Multi directional mechanical scanning in an ion implanter Multi directional mechanical scanning in an ion implanter

2006-09-12

2006-09-12

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S442110

Reexamination Certificate

active

07105838

ABSTRACT:
An end station for an ion implanter has a vacuum chamber which receives an ion beam. A wafer holder is mounted at the distal end of a scanning arm which has its proximal end attached to the chamber wall. The scanning arm has at least two rotary joints providing articulation of the arm to permit movement of the wafer holder in two orthogonal scan directions in a scan plane transverse to the beam path through the vacuum chamber. A scanning arm driver moves the substrate holder in the scan plane in a desired two-dimensional scan pattern relative to the beam path.

REFERENCES:
patent: 5003183 (1991-03-01), Nogami et al.
patent: 5194748 (1993-03-01), Aitken
patent: 5229615 (1993-07-01), Brune et al.
patent: 5406088 (1995-04-01), Brune et al.
patent: 5898179 (1999-04-01), Smick et al.
patent: 5956077 (1999-09-01), Qureshi et al.
patent: 6313469 (2001-11-01), Tamai
patent: 6953942 (2005-10-01), Graf et al.
patent: 7049210 (2006-05-01), Murrell et al.
patent: 2005/0247891 (2005-11-01), Asdigha et al.
patent: 1490481 (1977-11-01), None
patent: 63080454 (1988-04-01), None
patent: 2199758 (1990-08-01), None
patent: 3029258 (1991-02-01), None

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