Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2006-03-08
2008-10-07
Wells, Nikita (Department: 2881)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C250S440110, C250S441110, C118S733000, C216S067000, C156S345510
Reexamination Certificate
active
07431813
ABSTRACT:
Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The insert member is fixed to the exterior of the transfer chamber and the docking member is fixed to the insert member. The docking member has an extension received in a passageway of the process chamber, a support portion received in the insert member, and a flange received in a passageway of the transfer chamber. The extension, support portion and flange have different outer diameters in cross section such that inclined surfaces extend between the outer peripheral surfaces of the flange, the support portion and the extension. The annular seals are disposed along the inclined surfaces, and the extension prevents the annular seal from being damaged by plasma used to process a substrate in the process chamber.
REFERENCES:
patent: 5405480 (1995-04-01), Benzing et al.
patent: 5415729 (1995-05-01), Strasser et al.
patent: 6508885 (2003-01-01), Moslehi et al.
patent: 6907924 (2005-06-01), Moslehi
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
Wells Nikita
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