Multi-chamber system

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type

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Details

414937, 414939, 414941, 901 47, B65G 6500, B65G 4907

Patent

active

055584829

ABSTRACT:
A vacuum-process system comprising plural vacuum-process chambers in which substrates are processed in decompressed atmosphere, a first load lock chamber communicated with each of the vacuum-process chambers and exhausted to substantially same decompressed atmosphere as in the vacuum-process chambers, a second load lock chamber communicated with the first one and exhausted to substantially same atmosphere as in the first load lock chamber, a first carrier arranged in the first load lock chamber to carry the substrate between the first and the second load lock chamber, a first buffer assembly arranged in the first load lock chamber to temporarily hold plural substrates thereon, a second buffer assembly arranged in the second load lock chamber to temporarily hold plural substrates thereon, an assembly in the second load lock chamber to position single or plural substrates relative to their passage, and a second carrier arranged in normal atmosphere to carry plural substrates into and out of the second load lock chamber.

REFERENCES:
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5102291 (1992-04-01), Hine
patent: 5135608 (1992-08-01), Okutani
patent: 5306380 (1994-04-01), Hiroki
patent: 5380137 (1995-01-01), Wada

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