Multi chamber plasma process system

Details Multi chamber plasma process system Multi chamber plasma process system

2007-10-23

2007-10-23

Owens, Douglas W. (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C118S719000, C118S7230IR, C204S298350, C156S345320

Reexamination Certificate

active

11192414

ABSTRACT:
A multi-chamber plasma process system includes a plurality of process chambers, each of which has an inductively coupled plasma generator. The inductively coupled plasma generator is electrically connected to a main power supply through a first impedance matcher. The first impedance matcher has at least one variable inductor. Ignition electrodes of the inductively coupled plasma generators are connected in parallel with an ignition power supply configured as a variable transformer. The variable inductor of the first impedance matcher and the variable transformer of the ignition power supply are controlled by a controller. Each process chamber has a plasma density regulator. Power supply systems, including an ignition power source, a radio frequency (RF) power source, an impedance matcher, etc. can be effectively integrated. As a result, it is possible to decrease the area of facilities and the cost of the system, and to individually control the plasma density of each process chamber. Accordingly, process yield is improved, and productivity of the system is further improved.

REFERENCES:
patent: 5558751 (1996-09-01), Mahler et al.
patent: 6017221 (2000-01-01), Flamm
patent: 6213050 (2001-04-01), Liu et al.
patent: 6222718 (2001-04-01), Dible
patent: 6486431 (2002-11-01), Smith et al.
patent: 6822396 (2004-11-01), Gonzalez et al.
patent: 6836073 (2004-12-01), Matsushita
patent: 6962644 (2005-11-01), Paterson et al.
patent: 2002/0121345 (2002-09-01), Chen et al.
patent: 2003/0196757 (2003-10-01), Todorow et al.

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