Multi-beam laser exposer unit

Details Multi-beam laser exposer unit Multi-beam laser exposer unit

1997-11-14

1999-10-05

Spyrou, Cassandra

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359216, 359618, 359850, 347243, G02B 2608

Patent

active

059633549

ABSTRACT:
A multi-beam laser exposure unit of the present invention includes a light beam deflector for deflecting a light beam in a predetermined direction, a plurality of laser devices, a pre-optical system, including a glass lens and a plastic lens, for converting a cross sectional shape of a light beam emitted from the respective laser devices to a predetermined shape, and a post-deflection optical system, including two lenses for image-forming each light beam deflected by the deflector to be scanned on a predetermined image surface at a uniform speed. The power of the two lenses of the post-deflection optical system is defined to be positive in a direction parallel to a rotational axis of reflective surfaces of the deflector. Also, at least one lens surface of these lenses is formed not to include a rotational symmetrical surface.

REFERENCES:
patent: 4571021 (1986-02-01), Minoura et al.
patent: 5052767 (1991-10-01), Sugata et al.
patent: 5194952 (1993-03-01), Morimoto
patent: 5208456 (1993-05-01), Appel et al.
patent: 5251055 (1993-10-01), Koide
patent: 5463418 (1995-10-01), Tateoka
patent: 5471236 (1995-11-01), Ito

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