Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2006-10-04
2009-06-30
Nguyen, Thinh T (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S479000, C438S517000, C257S347000
Reexamination Certificate
active
07553709
ABSTRACT:
A semiconductor structure includes a metal oxide semiconductor field effect transistor that includes a body contact region that extends from body region located beneath a channel region that separates a pair of source/drain regions within the metal oxide semiconductor field effect transistor. The body contact region is recessed with respect to a surface of the channel region to avoid shorting between a body contact and the source/drain regions.
REFERENCES:
patent: 5872383 (1999-02-01), Yagishita
patent: 5962895 (1999-10-01), Beyer et al.
patent: 6387739 (2002-05-01), Smith, III
patent: 6724048 (2004-04-01), Min et al.
Luo Zhijiong
Zhu Huilong
International Business Machines - Corporation
Nguyen Thinh T
Schnurmann H. Daniel
Scully , Scott, Murphy & Presser, P.C.
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