MOS transistors having vertical current flow

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257335, 257336, 257401, H01L 2976

Patent

active

060939486

ABSTRACT:
The process provides first for the accomplishment of low-doping body regions at the sides and under a gate region and then the accomplishment of high-doping body regions inside said low-doping body regions and self-aligned with said gate region. There is thus obtained an MOS power transistor with vertical current flow which has high-doping body regions self-aligned with said gate region and with a reduced junction depth.

REFERENCES:
patent: 4345265 (1982-08-01), Blanchard
patent: 4587713 (1986-05-01), Goodman et al.
patent: 4672407 (1987-06-01), Nakagawa et al.
patent: 4803532 (1989-02-01), Mihara
patent: 4860072 (1989-08-01), Zommer
patent: 4974059 (1990-11-01), Kinzer
patent: 5057884 (1991-10-01), Suzuki et al.
patent: 5160985 (1992-11-01), Akiyama
patent: 5198688 (1993-03-01), Tsuchiya et al.
S.M. Sze; "Semiconductor Devices Physics and Technology"; 1985; pp 110-111.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

MOS transistors having vertical current flow does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with MOS transistors having vertical current flow, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MOS transistors having vertical current flow will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1338350

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.