Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-09-10
1995-01-03
Loke, Steven Ho Yin
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257364, 257366, 257401, H01L 2976, H01L 2994
Patent
active
053789130
ABSTRACT:
An MOS transistor has a source region, a drain region, first gate electrode with a first channel zone allocated to it, second gate electrodes having a second channel zone allocated to it, and a third gate electrode with a corresponding third channel zone. The second channel zone is more highly doped than the base material in which the MOS transistor is formed, while the third channel zone is more lightly doped than the second channel zone. The second and third gate electrodes are conductively connected so that higher drain voltages are accommodated at high-frequencies while avoiding tunnel punch-through.
REFERENCES:
IBM Technical Disclosure Bulletin, vol. 16, No. 5, Oct. 1973, "Bidirectional, high voltage, MOSFET's" by Fang et al., pp. 1653-1654.
Loke Steven Ho Yin
Siemens Aktiengesellschaft
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