MOS transistor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE29260

Reexamination Certificate

active

07612408

ABSTRACT:
The invention relates to a MOS transistor device of the trench type, in which, in a semiconductor region of a first conductivity type, within a deep gate trench extending in the vertical direction of the semiconductor region, a vertical gate electrode and a gate oxide with a field plate step insulating the latter are formed and, in an adjoining mesa region outside and laterally with respect to the deep trench, at the upper section thereof, a source electrode region of the first conductivity type and a body region of a second conductivity type with one or a plurality of assigned body contact are formed, a drain electrode region of the first conductivity type lying opposite the deep trench in the vertical direction. The MOS transistor has a deep body reinforcement of the second conductivity type below the body region at the location of the body contact, said body reinforcement lying deeper than the field plate step.

REFERENCES:
patent: 6285060 (2001-09-01), Korec et al.
patent: 6462376 (2002-10-01), Wahl et al.
patent: 2001/0023961 (2001-09-01), Hshieh et al.
patent: 2003/0020134 (2003-01-01), Werner et al.
patent: 2003/0173618 (2003-09-01), Zundel et al.
patent: 1 168 455 (2001-06-01), None

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