Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-04-10
2007-04-10
Wilczewski, M. (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S344000, C257S549000, C257S550000, C257S408000
Reexamination Certificate
active
10903027
ABSTRACT:
A MOS transistor includes a drain zone, a source zone, and a gate electrode. Doping atoms of the first conductivity type are implanted in the region of the drain zone and the source zone by at least two further implantation steps such that a pn junction between the drain zone and a substrate region is vertically shifted and a voltage ratio of the MOS transistor between a lateral breakdown voltage and a vertical breakdown voltage can be set.
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Warren R. Anderson et al.: ,,ESD Protection for Mixed-Voltage I/O Using NMOS Transistors Stacked in a Cascade Configuration,Proceedings of the EOS/ESD Symposium 1998, pp. 54-63.
Esmark Kai
Gossner Harald
Mackh Gunther
Owen Richard
Zängl Franz
Greenberg Laurence A.
Infineon - Technologies AG
Lewis Monica
Locher Ralph E.
Stemer Werner H.
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