Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1999-11-03
2000-11-07
Meier, Stephen D.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257328, H01L 2976, H01L 2994
Patent
active
061440655
ABSTRACT:
An MOS-gated power semiconductor device is formed by a process in which a self-aligned device cell is formed without any critical alignments. A sidewall spacer is used to mask the etching of a depression in the silicon to reduce the number of critical alignment steps. An optional selectively formed metal connects the polysilicon layer to the P+ and N+ diffusion regions. The sidewall spacer, in combination with the selectively formed metal, prevents impurities from diffusing to the parasitic DMOS channels and inverting them to cause leakage. A termination structure may also be formed by this process.
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International Rectifier Corporation
Meier Stephen D.
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