MOS capacitor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S369000, C257S401000, C438S199000, C438S275000

Reexamination Certificate

active

10965856

ABSTRACT:
A semiconductor device in which a dielectric breakdown of a gate oxide in a MOS capacitor can be prevented and in which a circuit area can be reduced. The semiconductor device comprises an NMOS transistor a gate of which is connected to a terminal VDD on a high potential side and a PMOS transistor a gate of which is connected to a terminal GND on a low potential side, source/drain (S/D) regions of the NMOS transistor and source/drain (S/D) regions of the PMOS transistor being electrically connected.

REFERENCES:
patent: 4453090 (1984-06-01), Sempel
patent: 5008799 (1991-04-01), Montalvo
patent: 5544102 (1996-08-01), Tobita et al.
patent: 5926064 (1999-07-01), Hariton
patent: 5982247 (1999-11-01), Yoshizawa et al.
patent: 6303957 (2001-10-01), Ohwa
patent: 6791383 (2004-09-01), Chatterjee
patent: 03016260 (1991-01-01), None
patent: 05-268761 (1993-10-01), None
patent: 10-256489 (1998-09-01), None
Sedra, Adel S., and Kenneth C. Smith, ed. Microelectronic Circuits. 4th ed. New York: Oxford University Press, 1998.
Metzger, Robert. “CMOS gets ready for high-speed wireless LANs.” Compound Semiconductor Sep. 2002. Nov. 17, 2005 <http://www.compoundsemiconductor.net/articles/magazine/8/9/5/1>.
Sedra, Adel S., and Kenneth C. Smith, ed. Microelectronic Circuits. 4th ed. New York: Oxford University Press, 1998, p. 374.

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