Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-24
2009-08-04
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S905000, C430S910000, C526S259000, C526S280000, C526S288000, C540S476000, C564S090000
Reexamination Certificate
active
07569325
ABSTRACT:
A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.wherein, R* is a hydrogen atom or a methyl group, R1and R2are independently a C1˜C20alkyl group, a C4˜C20cycloalkyl group, a C6˜C20aryl group or a C7˜C20arylalkyl group, one of R1and R2may not exist, and R1and R2can be connected to form a ring.
REFERENCES:
patent: 6114083 (2000-09-01), Kawamura et al.
patent: 6153352 (2000-11-01), Oohashi et al.
patent: 03211557 (1991-09-01), None
Kim Deog-Bae
Kim Jae-Hyun
Kim Sang-Jung
Lee Jae-Woo
Lee Jung-Youl
Birch & Stewart Kolasch & Birch, LLP
Chu John S
Dongjin Semichem Co., Ltd.
LandOfFree
Monomer having sulfonyl group, polymer thereof and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Monomer having sulfonyl group, polymer thereof and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monomer having sulfonyl group, polymer thereof and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4099803