Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-11-27
2009-12-08
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S323000, C430S272100, C556S440000, C528S361000, C438S952000
Reexamination Certificate
active
07629110
ABSTRACT:
A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formulawherein, R1is a hydrogen atom, a methyl group or an ethyl group, R2is a C1˜C20alkylene group, a C3˜C20cycloalkylene group or a C6˜C20aromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.
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Kim Hyun-Jin
Kim Jae-Hyun
Kim Jeong-Sik
Kim Sang-Jeoung
Park Jong-Kyoung
Birch & Stewart Kolasch & Birch, LLP
Dongjin Semichem Co., Ltd.
Hamilton Cynthia
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