Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2005-05-03
2005-05-03
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S027000, C216S041000, C216S057000
Reexamination Certificate
active
06887393
ABSTRACT:
A monolithic thermal ink jet printhead (40) comprising a groove (45), a plurality of chambers (74) and nozzles (56) is manufactured by means of steps of: (203, 205) partially etching the groove (45) by means of a “dry” process and a “wet” process; (210) depositing a plurality of sacrificial layers (54); (212) obtaining a plurality of casts (156); (216) completing the etching of the groove (45) by means of an electrochemical process; and (220) removing the casts (156) and the sacrificial layers (54) in such a way as to obtain a plurality of nozzles (56) and chambers (74).
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Conta Renato
Merialdo Anna
Banner & Witcoff , Ltd.
Olivetti Tecnost S.p.A.
Olsen Allan
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