Monolithic miniaturized inductively coupled plasma source

Details Monolithic miniaturized inductively coupled plasma source Monolithic miniaturized inductively coupled plasma source

1996-08-28

1999-08-24

Lee, Benny T.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

118723I, H05H 146

Patent

active

059428554

ABSTRACT:
A monolithic inductively coupled plasma generator includes a first substrate having an electrical circuit disposed thereon which includes a substantially planar inductive coil, a capacitor electrically coupled in series with the coil, and a drive circuit electrically coupled to the coil for driving the circuit at resonance. The plasma generator further includes a plasma chamber proximate the coil in which a gas is excited. In accordance with the invention, a method of fabricating an inductively coupled plasma generator includes the steps of providing a first substrate, depositing at least one layer of conductive material on the first substrate, patterning and etching the at least one layer of conductive material to form an electrical circuit including a coil and a capacitor, providing a plasma chamber proximate the electrical circuit, providing a gas to the plasma chamber, and connecting an oscillator to the electrical circuit for providing radio frequency energy to the electrical circuit wherein the gas is excited into a plasma.

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