Monocrystalline test structures, and use for calibrating instrum

Details Monocrystalline test structures, and use for calibrating instrum Monocrystalline test structures, and use for calibrating instrum

1995-03-23

1997-11-04

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

257 48, 324158R, G01R 3126

Patent

active

056843011

ABSTRACT:
An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and for calibrating instruments for such measurements, is formed from a monocrystalline starting material, having an insulative layer formed beneath its surface by ion implantation or the equivalent, leaving a monocrystalline layer on the surface. The monocrystalline surface layer is then processed by preferential etching to accurately define components of the test structure. The substrate can be removed from the rear side of the insulative layer to form a transparent window, such that the test structure can be inspected by transmissive-optical techniques. Measurements made using electrical and optical techniques can be correlated with other measurements, including measurements made using scanning probe microscopy.

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