Monoacrylate or diacrylate of 2-methyl-propylene glycol and phot

Details Monoacrylate or diacrylate of 2-methyl-propylene glycol and phot Monoacrylate or diacrylate of 2-methyl-propylene glycol and phot

1984-06-21

1985-06-11

Lieberman, Allan M.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430288, 430915, 20415916, 20415912, 20415915, 525 59, 525502, 527314, 560224, C08F 250

Patent

active

045229139

ABSTRACT:
Mono(meth)acrylate or di(meth)acrylate of 2-methylpropylene glycol. The diacrylate, or a low molecular weight oligomer thereof, with polymeric filler and sensitizer is useful as a photosensitive component.

REFERENCES:
patent: 3634369 (1972-01-01), Baumann
patent: 3660145 (1972-05-01), Johnson et al.
patent: 3980627 (1976-09-01), McDowell et al.
patent: 4187383 (1980-02-01), Cowherd et al.
patent: 4245077 (1981-01-01), Demarco
Chao, Ve-Hsiav et al., Chemical Abstracts, vol. 90, (1979), #122,634 p. and Chemical Substances Index, (1971-1981), at p. 44,373CS.

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