Monitor pattern of semiconductor device and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

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C257S379000, C257S543000, C257S536000

Reexamination Certificate

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06992327

ABSTRACT:
A plurality of diffused resistors and a plurality of wirings (resistive elements) are alternately disposed along a virtual line, and those diffused resistors and wirings are connected in series by contact vias. In the same wiring layer as that of the wirings, a dummy pattern is formed so as to surround a formation region of the wirings and the diffused resistors. A space between the dummy pattern and the wirings is set in accordance with, for example, a minimum space between wirings in a chip formation portion.

REFERENCES:
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patent: 5502431 (1996-03-01), Usui
patent: 6172389 (2001-01-01), Sakoh
patent: 6403979 (2002-06-01), Kadosh et al.
patent: 6472701 (2002-10-01), Yaegashi et al.
patent: 6518642 (2003-02-01), Kim et al.
patent: 6559055 (2003-05-01), Tuan et al.
patent: 6611042 (2003-08-01), Haruhana et al.
patent: 6784548 (2004-08-01), Kouno et al.
patent: 6787799 (2004-09-01), Asam et al.

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