Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-02-16
2008-11-18
Visconti, Geraldina (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S313000, C430S322000, C430S325000
Reexamination Certificate
active
07452658
ABSTRACT:
Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.
REFERENCES:
“Lithography Based on Molecular Glasses”, Journal of Photopolymer Science and Technology, vol. 18, No. 3, 2005, pp. 431-434.
“Adamantane Based Molecular Glass Resist for 193 nm Lithography”, Shinji Tanaka and Christopher K. Ober. 12 pages.
“Materials for Future Lithography”, Seung Wook Chang et al., Advances in Resist Technology and Processing XXII, Proceedings of SPIE, vol. 5753, 2005, pp. 1-9.
“Lithography Based on Calix[4]resorcinarene and Related Molecular Glasses”, Seung Wook Chang et al , Materials Science and Engineering, Cornell University, School of Chemical and Biomolecular Engineering, Cornell University, 2 pages.
“Lithography at Short Wavelengths: New Strategies”, Christopher K. Ober et al , Materials Science & Engineering, Cornell University, Bard Hall, Ithaca, NY, 1 page.
“New Strategies for Lithography at Short Wavelengths”, Christopher K Ober et al , Materials Science and Engineering, Cornell University, Ithaca, NY, 1 page.
“Nanomolecular Resists with Adamantane Core for 193-nm Lithography”, Jin-Baek Kim et al , Advances in Resist Technology and Processing XXII, Proceedings of SPIE 5753, 2005, pp. 603-610.
“Dry Etch Resistance of Organic Materials”, H. Gokan et al., Basic Technol Res Lab., Nippon Electro. Co. Ltd., Journal of the Electrochemical Society, 1982, 1 page.
“Glass-Forming Binaphthyl Chromophores”, Jacek C Ostrowski et al , Chem. Eur J 2001, 1, No. 20, pp. 4500-4511.
“Tridurylboranes Extended by Three Arylethynyl Groups as a New Family of Boron-Based π-Electron Systems”, Shigehiro Yamaguchi et al , Institute for Chemical Research, Kyoto University, American Chemical Society, Organic Letters 2000, vol. 2, No. 26, pp. 4129-4132.
“Patterning Capabilities of EUV Resists”, Wang Yueh, et al., Advances in Resists Technology and Processing XXI, Proceedings of SPIE, vol. 5376, 2004, pp. 434-442.
“Sources of Line Width Roughness for EUV Resists”, Heido Cao, et al , Advances in Resists Technology and Processing XXI, Proceedings of SPIE, vol. 5376, 2004, pp. 757-764.
“Novel Class of Low Molecular-Weight Organic Resists for Nanometer Lithography”, Motoko Yoshiiwa, et al., Appl. Phys. Lett. 69 (17), Oct. 1996, pp. 2605-2607.
“Vitrigens Part 2—Low Molecular Weight Organic Systems with High Glass Transition Temperatures”, Alid D. Braun et al., J. Mater. Chem., 1998 8(4), pp. 847-851 A Tetrahedral Oligo(phenylenevinylene) Molecule of Intermediate Dimensions: Effect of Molecular Shape on the Morphology and Electroluminescence of Organic Glasses, Matthew R Robinson, et al , Adv. Funct. Mater. 2001, 11, No. 6, pp. 413-419.
“A Novel Family of Boron-C containing Hole-Blocking Amorphous Molecular Materials for Blue-and Blue-Violet-Emitting Organic Electroluminescent Devices”, Motoi Kinoshita et al., Adv. Funct. Mater. 2002, 12, No. 11-12, pp. 780-786.
“Optimization of High-Performance Blue Organic Light-Emitting Diodes Containing Tetraphenylsilane Molecular Glass Materials”, Li-Hsin Chan et al , J. Am. Chem Soc 2002, 124, pp. 6469-6479.
“Photo- and Electroactive Amorphous Molecular Material-Molecular Design, Syntheses, Reactions, Properties, and Applications”, Yasuhiko Shirota, The Royal Society of Chemistry, 2005, 15, pp. 75-93.
“Charge-Transporting Molecular Glasses”, Peter Strohriegl et al., Adv Mater 2002, 14, No. 20, 2002, pp. 1439-1452.
“Synthesis of Molecular ‘Jacks’: Rigid Tetrahedral Molecules with p-Phenylene Arms”, Ladislav M. Wilson et al., J. Mater. Chem, 1993, vol. 3, pp. 991-994.
“Holesteric Liquid Crystals-New Materials for Holographic Applications”, Ulrich Theissen et al , Adv. Mater. 2000, 12, No. 22, pp. 1698-1700.
“White Light Emission from Organic LEDs Utilizing Spiro Compounds with High-Temperature Stability”, Frank Steuber et al., Adv. Mater. 2000, 12, No. 2, pp. 130-133.
“Methyl-substituted Derivates of 1,3,5-tris(diphenylamino)benzene as a Novel Class of Amorphous Molecular Materials”, Ishikawa, Wataru et al., chemistry Letters, 1991, 1 page.
“Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resists Materials Designed for Sib-100 nm Lithography”, David C. Tully, et al., Adv. Mater. 2000, 12, No. 15, pp. 1118-1122.
“Synthesis, Spectroscopy, and Morphology of Tetrastilbenoidmethanes”, Warren J. Oldham, Jr. et al., J. Am. Chem. Soc. 1998, 120, pp. 2987-2988.
“Novel Resists with Non-traditional Compositions for EUV Lithography”, Junyan Dai et al., Advances in Resist Technology and Processing XXI, Proceedings of SPIE vol. 5376, 2004, pp. 508-5816.
“Silicon Backbone Polymers as EUV Resists”, J., Pablo Bravo-Vasquez, et al., Advances in Resist Technology and Processing XXI, Proceedings of SPIE vol. 5376, 2004, pp. 739-745.
“Derivatives of Tetraphenylmethane and Tetraphenylsilane: Synthesis of new Tetrahedral Building Blocks for Molecular Construction”, Jean-Hugues Fournier, et al., Can J. Chem , 81, 2003, pp. 376-380.
“A Positive-Working Alkaline Developable Photoresist Based on Partially tert-Boc-protected Calix[4]resorcinarene and Photoacid generator”, Kwon Young-Gil et al., J. Mater. Chem 2002, 12, pp. 53-57.
“Synthesis and Properties of a Hole-Conducting, Photopatternable Molecular Glass”, Thomas Fuhrmann et al., Chem. Mater. 1999, 11, pp. 2226-2232.
“Expanded Tetrahedral Molecules from 1, 3, 5, 7-Tetraphenyladamantane”, Veronica R Reichert et al., Macromolecules 1994, 27, pp. 7015-7023.
“Synthesis, Morphology, and Optical Properties of Tetrahedral Oligo(phenylenevinylene) Materials”, Shujun Wang et al., J. Am. Chem. Soc. 2000, 122, pp. 5695-5709.
De Silva Ekmini Anuja
Forman Drew C.
Ober Christopher K.
Cornell University
Miller Matthias & Hull
Visconti Geraldina
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