Molecular beam epitaxy source cell

Details Molecular beam epitaxy source cell Molecular beam epitaxy source cell

1996-04-29

1998-02-03

Garrett, Felisa

Coating apparatus

Gas or vapor deposition

117108, 118719, 118726, C23C 1600

Patent

active

057140081

ABSTRACT:
Apparati and methods for varying the flux of a molecular beam emanating from an effusion cell are disclosed. The apparatus includes a means for controllably adjusting the angular distribution of a molecular field effusing from a source material within the effusion cell, therein adjusting the flux of the beam. The method herein disclosed, with respect to the related apparati, including the step of selectively altering the angular distribution of an effusing molecular field, produced by a heated source material, which comprises the molecular beam, thereby varying the flux of the beam.

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