Coating apparatus – Gas or vapor deposition
Patent
1996-04-29
1998-02-03
Garrett, Felisa
Coating apparatus
Gas or vapor deposition
117108, 118719, 118726, C23C 1600
Patent
active
057140081
ABSTRACT:
Apparati and methods for varying the flux of a molecular beam emanating from an effusion cell are disclosed. The apparatus includes a means for controllably adjusting the angular distribution of a molecular field effusing from a source material within the effusion cell, therein adjusting the flux of the beam. The method herein disclosed, with respect to the related apparati, including the step of selectively altering the angular distribution of an effusing molecular field, produced by a heated source material, which comprises the molecular beam, thereby varying the flux of the beam.
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Anderson et al., Materials Science 4th Ed., Chapman & Hall, New York, 1990, pp. 464-466.
Lee Myung B.
Vanhatalo Jari
Anderson Terry J.
Garrett Felisa
Hoch Jr. Karl J.
Northrop Grumman Corporation
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