Mold for nano-imprinting and method of manufacturing the same

Details Mold for nano-imprinting and method of manufacturing the same Mold for nano-imprinting and method of manufacturing the same

2007-02-26

2010-10-26

Ewald, Maria Veronica D (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Preform reshaping or resizing means: or vulcanizing means...

Surface deformation means only

C425S174400, C264S293000

Reexamination Certificate

active

07819652

ABSTRACT:
A nano-imprint mold and a method of manufacturing the same are provided, which can be used for replicating a nano-scaled structure to a polymer layer. The nano-imprint mold comprises: a substrate; a pattern portion having a prominence and depression pattern formed on the substrate; a hard layer formed of a material with a hardness higher than the pattern portion on a surface of the pattern portion; and a separation layer formed on a surface of the hard layer. In the nano-imprint mold of the present invention, an original pattern can be uniformly replicated even on a substrate with an irregular surface. Further, the pattern can be prevented from being damaged by pressure and being contaminated by synthetic resin, resulting in better accuracy and durability of the pattern.

REFERENCES:
patent: 6030556 (2000-02-01), DePuydt et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 2004/0191700 (2004-09-01), Kuwabara et al.
patent: 2005/0116299 (2005-06-01), Koning et al.
patent: 2005/0236360 (2005-10-01), Watts et al.
patent: 2006/0290026 (2006-12-01), Chae et al.
patent: 2007/0090574 (2007-04-01), Terasaki et al.

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